Cationic photosensitive formulations based on silyl radical chemistry for green and red diode laser exposure

Author:

Tehfe Mohamad-Ali,Gigmes Didier,Dumur Frédéric,Bertin Denis,Morlet-Savary Fabrice,Graff Bernadette,Lalevée Jacques,Fouassier Jean-Pierre

Publisher

Royal Society of Chemistry (RSC)

Subject

Organic Chemistry,Polymers and Plastics,Biochemistry,Bioengineering

Reference34 articles.

1. A. Reiser , Photoreactive Polymers: the Science and Technology of Resists, Wiley, New York, 1989

2. Photoresponsive Polymers, ed. V. Krongauz and A. Trifunac, Chapman and Hall, New York, 1994

3. J.-P. Fouassier , Photoinitiation, Photopolymerization, Photocuring, Hanser, Münich, 1995

4. S. Davidson , Exploring the Science, Technology and Application of UV and EB Curing, Sita Technology Ltd, London, 1999

5. D. C. Neckers , UV and EB at the Millenium, Sita Technology, London, 1999

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