Heterogeneous UV disinfection aided by ZnO/Al2O3 composites for inhibiting antibiotic resistant bacteria photoreactivation and gene recovery

Author:

Wang Xu12,Zhang Baiyu3ORCID,Ren Hua4,Jia Yibin12,Xia Honghuan12,Guo Ping125ORCID

Affiliation:

1. Key Lab of Groundwater Resources and Environment, Ministry of Education, Jilin University, Changchun 130021, People's Republic of China

2. College of New Energy and Environment, Jilin University, Changchun 130021, People's Republic of China

3. Department of Civil Engineering, Faculty of Engineering and Applied Science, Memorial University, St. John's, NL, A1B 3X5, Canada

4. Department of Ophthalmology, The First Hospital of Jilin University, Changchun, China

5. State Key Laboratory of Superhard Materials, Jilin University, Changchun 130021, People's Republic of China

Abstract

Photoreactivation has limited antibiotic resistant bacteria (ARB) and gene (ARG) reduction by ultraviolet (UV) heterogeneous disinfection.

Funder

Key State Laboratory of Superhard Materials

Publisher

Royal Society of Chemistry (RSC)

Subject

General Environmental Science,Materials Science (miscellaneous)

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