Extremely suppressed thermal conductivity of large-scale nanocrystalline silicon through inhomogeneous internal strain engineering-Reference-Cited by-同舟云学术

Extremely suppressed thermal conductivity of large-scale nanocrystalline silicon through inhomogeneous internal strain engineering

Published:2023 Issue:35 Volume:11 Page:19017-19024
ISSN:2050-7488
Container-title:Journal of Materials Chemistry A
language:en
Short-container-title:J. Mater. Chem. A

Author:

Xu Bin¹²,Liao Yuxuan¹,Fang Zhenglong¹,Li Yifei¹,Guo Rulei¹,Nagahiro Ryohei¹,Ikoma Yoshifumi³^ORCID,Kohno Masamichi⁴⁵^ORCID,Shiomi Junichiro¹²^ORCID

Affiliation:

1. Department of Mechanical Engineering, The University of Tokyo, 7-3-1 Hongo, Bunkyo, Tokyo 113-8656, Japan

2. Institute of Engineering Innovation, The University of Tokyo, 2-11 Yayoi, Bunkyo, Tokyo 113-8656, Japan

3. Department of Materials Science and Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka, 819-0395, Japan

4. Department of Mechanical Engineering, Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan

5. International Institute for Carbon-Neutral Energy Research (WPI-I2CNER), Kyushu University, 744 Motooka, Nishi-ku, Fukuoka 819-0395, Japan

Abstract

Record low thermal conductivity was achieved in large-scale crystal silicon due to the effect of inhomogeneous internal strain-induced phonon engineering via HPT processing.

Funder

Core Research for Evolutional Science and Technology

Japan Society for the Promotion of Science

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science,Renewable Energy, Sustainability and the Environment,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2023/TA/D3TA03011C

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