Oxygen insensitive thiol–ene photo-click chemistry for direct imprint lithography of oxides-Reference-Cited by-同舟云学术

Oxygen insensitive thiol–ene photo-click chemistry for direct imprint lithography of oxides

Published:2018 Issue:21 Volume:8 Page:11403-11411
ISSN:2046-2069
Container-title:RSC Advances
language:en
Short-container-title:RSC Adv.

Author:

Nagarjuna Ravikiran¹²³⁴,Saifullah Mohammad S. M.⁵⁶⁷⁸,Ganesan Ramakrishnan¹²³⁴^ORCID

Affiliation:

1. Department of Chemistry

2. Birla Institute of Technology and Science (BITS) Pilani, Hyderabad Campus

3. Hyderabad

4. India

5. Institute of Materials Research and Engineering

6. A*STAR (Agency for Science, Technology, and Research)

7. Singapore 138634

8. Republic of Singapore

Abstract

Metal-containing oxygen-insensitive photocurable resin formulations are designed based on thiol–ene click chemistry that are suitable for UV nanoimprinting to directly pattern oxides.

Funder

Science and Engineering Research Board

Publisher

Royal Society of Chemistry (RSC)

Subject

General Chemical Engineering,General Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2018/RA/C8RA01688G

Reference71 articles.

1. Facile and High-Throughput Synthesis of Functional Microparticles with Quick Response Codes

2. The growing impact of click chemistry on drug discovery

3. Fabrication of highly photoluminescent quantum dot-polymer composite micropatterned surface using thiol-ene chemistry

4. Biofunctional Silicon Nanoparticles by Means of Thiol-Ene Click Chemistry

5. Functional polymer particles via thiol–ene and thiol–yne suspension “click” polymerization

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