Synthesis and characterisation of novel aluminium and gallium precursors for chemical vapour deposition
Author:
Affiliation:
1. Department of Chemistry
2. University College London
3. Christopher Ingold Laboratories
4. London
5. UK
Abstract
Synthesis of novel β-ketoiminate compounds (aluminium and gallium) which have been used for the first time as precursors in (AACVD).
Funder
Engineering and Physical Sciences Research Council
Publisher
Royal Society of Chemistry (RSC)
Subject
Materials Chemistry,General Chemistry,Catalysis
Link
http://pubs.rsc.org/en/content/articlepdf/2015/NJ/C5NJ00947B
Reference57 articles.
1. Molecular precursor approach to metal oxide and pnictide thin films
2. Aerosol-Assisted Chemical Vapor Deposition of Transparent Conductive Gallium−Indium−Oxide Films
3. Aerosol-Assisted Chemical Vapour Deposition of Transparent Zinc Gallate Films
4. Single-source precursors to gallium and indium oxide thin films
5. Group 13 β-Ketoiminate Compounds: Gallium Hydride Derivatives As Molecular Precursors to Thin Films of Ga2O3
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