Growth behavior of Ir metal formed by atomic layer deposition in the nanopores of anodic aluminum oxide-Reference-Cited by-同舟云学术

Growth behavior of Ir metal formed by atomic layer deposition in the nanopores of anodic aluminum oxide

Published:2022 Issue:25 Volume:51 Page:9664-9672
ISSN:1477-9226
Container-title:Dalton Transactions
language:en
Short-container-title:Dalton Trans.

Author:

Zhu Lin¹,Yang Geng-Lai¹,Ding Wen-Juan¹²,Cao Yan-Qiang³^ORCID,Li Wei-Ming¹²,Li Ai-Dong¹^ORCID

Affiliation:

1. National Laboratory of Solid State Microstructures, Materials Science and Engineering Department, College of Engineering and Applied Sciences, Collaborative Innovation Center of Advanced Microstructures, Nanjing University, Nanjing 210093, P. R. China

2. Jiangsu Leadmicro Nano-Technology Co., Ltd, Wuxi, Jiangsu, People's Republic of China

3. Institute of Micro-nano Photonic & Beam Steering, School of Science, Nanjing University of Science and Technology, Nanjing 210094, P. R. China

Abstract

The growth behavior of ALD metallic Ir has been explored on various surfaces and in AAO nanopores systematically. The surface hydrophilicity and O2 partial pressure are crucial. The Ir infiltration depth into AAO follows a diffusion-limited model.

Funder

Transformation Program of Scientific and Technological Achievements of Jiangsu Province

National Natural Science Foundation of China

Natural Science Foundation of Jiangsu Province

Publisher

Royal Society of Chemistry (RSC)

Subject

Inorganic Chemistry

Link

http://pubs.rsc.org/en/content/articlepdf/2022/DT/D2DT01358D

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