Large-area ultrathin Te films with substrate-tunable orientation-Reference-Cited by-同舟云学术

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Large-area ultrathin Te films with substrate-tunable orientation

Published:2020 Issue:23 Volume:12 Page:12613-12622
ISSN:2040-3364
Container-title:Nanoscale
language:en
Short-container-title:Nanoscale

Author:

Bianco Elisabeth¹²³⁴^ORCID,Rao Rahul⁵⁶⁷⁴^ORCID,Snure Michael⁸⁶⁷⁴,Back Tyson⁵⁶⁷⁴^ORCID,Glavin Nicholas R.⁵⁶⁷⁴^ORCID,McConney Michael E.⁵⁶⁷⁴,Ajayan P. M.¹²³⁴⁹,Ringe Emilie¹²³⁴¹⁰^ORCID

Affiliation:

1. Department of Chemistry

2. Rice University

3. Houston

4. USA

5. Materials and Manufacturing Directorate

6. Air Force Research Laboratory

7. WPAFB

8. Sensors Directorate

9. Department of Materials Science and NanoEngineering

10. Department of Materials Science & Metallurgy

Abstract

A novel approach affords low temperature, large area growth of ultrathin Te films with tunable orientation providing access to inherent anisotropic properties.

Funder

Air Force Office of Scientific Research

3M

National Science Foundation

Air Force Research Laboratory

Publisher

Royal Society of Chemistry (RSC)

Subject

General Materials Science

Link

http://pubs.rsc.org/en/content/articlepdf/2020/NR/D0NR01251C

Reference65 articles.

1. Structure and growth of oriented tellurium thin films

2. Structure, growth and orientation of vacuum deposited tellurium films

3. Electrical properties of tellurium thin films

4. Large grain tellurium thin films

5. Colloquium: Topological insulators

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