Design simulations of a horizontally deflecting high-heat-load monochromator

Abstract

The performance of a liquid-nitrogen-cooled high-heat-load monochromator with a horizontal scattering plane has been analysed, aiming to preserve the high quality of the X-ray beam in the vertical plane for downstream optics. Using finite-element analysis, height profiles of the crystal surface for various heat loads and the corresponding slope errors in the meridional and sagittal planes were calculated. Then the angular distortions of the reflected beam in both meridional and sagittal planes were calculated analytically and also modelled by ray tracing, revealing a good agreement of the two approaches. The results show that with increasing heat load in the crystal the slope errors of the crystal surface reach their smallest values first in the sagittal and then in the meridional plane. For the considered case of interest at a photon energy of 14.412 keV and the Si(111) reflection with a Bragg angle of 7.88°, the angular distortions of the reflected beam in the sagittal plane are an order of magnitude smaller than in the meridional one. Furthermore, they are smaller than the typical angular size of the beam source at the monochromator position. For a high-heat-load monochromator operating in the horizontal scattering plane, the sagittal angular distortions of the reflected beam appear in the vertical plane. Thus, such an instrument perfectly preserves the high quality of the X-ray beam in the vertical plane for downstream optics. Compared with vertical scattering, the throughput of the monochromatic beam with the horizontal scattering plane is reduced by only 3.3% for the new EBS source, instead of 34.3% for the old ESRF-1 machine. This identifies the horizontal-scattering high-heat-load monochromator as a device essentially free of the heat-load effects in the vertical plane and without significant loss in terms of throughput.