Ultrahigh-Vacuum Reaction Apparatus to Study Synchrotron-Radiation-Stimulated Processes-Reference-Cited by-同舟云学术

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Ultrahigh-Vacuum Reaction Apparatus to Study Synchrotron-Radiation-Stimulated Processes

Published:1998-11-01 Issue:6 Volume:5 Page:1363-1368
ISSN:0909-0495
Container-title:Journal of Synchrotron Radiation
language:
Short-container-title:J Synchrotron Radiat

Author:

Hirano S.,Yoshigoe A.,Nagasono M.,Mase K.,Ohara J.,Nonogaki Y.,Takeda Y.,Urisu T.

Publisher

International Union of Crystallography (IUCr)

Subject

Instrumentation,Nuclear and High Energy Physics,Radiation

Link

http://journals.iucr.org/s/issues/1998/06/00/hi0067/hi0067.pdf

Cited by 9 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Area-Selective Depositions of Self-assembled Monolayers on Patterned SiO2/Si Surfaces;Toward Functional Nanomaterials;2009

2. Synchrotron-radiation-stimulated etching of SiO2thin films with a tungsten nano-pillar mask;Journal of Synchrotron Radiation;2006-10-18

3. Synchrotron radiation stimulated etching of SiO2 thin films;Acta Physica Sinica;2006

4. Synchrotron radiation stimulated etching SiO2 thin films with a contact cobalt mask;Applied Surface Science;2005-04

5. Synchrotron radiation stimulated etching SiO 2 thin films with a contact micropattern mask;SPIE Proceedings;2005-01-27

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