Quantitative microstructural and texture characterization by X-ray diffraction of polycrystalline ferroelectric thin films

Abstract

Texture becomes an important issue in ferroelectric materials as it greatly influences the physical properties of polycrystalline films. The use of advanced methods of analysis of the X-ray diffraction profiles, namely quantitative texture analysis or the recently developed combined approach, allows access to quantitative information on the different components of the global texture and to more accurate values of structural and microstructural parameters of both the ferroelectric film and the substrate, not available by more conventional methods of analysis. The results obtained allow important conclusions to be drawn regarding the mechanisms that lead to the development of preferred orientations in thin films and, also, the correlation between them and the ferroelectric behaviour. For example, it is observed that the inducement of a strong 〈111〉 texture component does not mean the complete disappearance of the so-called `natural' 〈100〉, 〈001〉 components, and that the ratio between the contributions to the global texture of these two components can be changed by the presence of tensile or compressive stress during crystallization of the films. The relative contributions of these texture components are also related to the final properties of the ferroelectric films.