Author:
Park Y. J.,Youn H. S.,Banerjee S.,Lee D. R.,Baik H. M.,Lee K.-B.,Kim K. J.,Moon D. W.
Abstract
Specular and non-specular X-ray reflectivity intensities of a (Ta/Si)60 multilayer sample were measured to characterize its interface structure. Since the multilayer has a good reflectance at its multilayer peaks, its performance as a wide-bandpass monochromator for X-ray scattering experiments of polymers has been tested.
Publisher
International Union of Crystallography (IUCr)
Subject
Instrumentation,Nuclear and High Energy Physics,Radiation
Cited by
1 articles.
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