Author:
Oji Hiroshi,Taniguchi Yosuke,Hirayama Sayaka,Ofuchi Hironori,Takagaki Masashi,Honma Tetsuo
Abstract
A novel XAFS measurement system has been developed in which XAFS measurements can be performed including sample-loading and detector adjustments. With this system, XAFS measurements of up to 80 samples in both transmission and fluorescence modes can be carried out. The adjustment of the optical components has also been automated. It not only saves manpower and measurement time, but also improves the accuracy and reliability of sample alignments.
Publisher
International Union of Crystallography (IUCr)
Subject
Instrumentation,Nuclear and High Energy Physics,Radiation
Cited by
37 articles.
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