Suppression of Void on Electroplating Using Supercritical Carbon Dioxide Emulsion

Author:

SONE Masato1,CHANG Tso-Fu Mark1,SHIMIZU Tetsuya1

Affiliation:

1. Precision &Intelligence Laboratory, Tokyo Institute of Technology

Publisher

The Surface Finishing Society of Japan

Subject

General Engineering

Reference8 articles.

1. 5) M. Sone, S. Miyata ; Material Chemistry in Supercritical Fluids, p.22 (Research Signpost, 2005).

2. 6) M. Sone, H. Uchiyama, T. F. M. Chang ; Advanced Topics on Crystal Growth, p.335 (INTECH, 2013).

3. 8) T. F. M. Chang, M. Sone ; Surf. Coat. Tech., 205, 3890 (2011).

4. 9) T. F. M. Chang, M. Sone, A. Shibata, C. Ishiyama, Y. Higo ; Electrochim.Acta, 55, 6469 (2010).

5. 10) T. F. M. Chang, T. Tasaki, C. Ishiyama, M. Sone ; Ind. Eng. Chem. Res., 50, 8080 (2011).

Cited by 2 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献

1. Electroless Plating Method Using Supercritical Carbon Dioxide Emulsion;Journal of the Surface Finishing Society of Japan;2016

2. Electroless plating of Ni thin films using foam of electrolyte;Japanese Journal of Applied Physics;2015-12-14

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