Formation of Porous Aluminum Films with Isolated Columnar Structure Using Physical Vapor Deposition for Medium-Voltage and High-voltage Capacitors-Reference-Cited by-同舟云学术

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Formation of Porous Aluminum Films with Isolated Columnar Structure Using Physical Vapor Deposition for Medium-Voltage and High-voltage Capacitors

Published:2009 Issue:3 Volume:60 Page:166-169
ISSN:0915-1869
Container-title:Journal of The Surface Finishing Society of Japan
language:
Short-container-title:Journal of The Surface Finishing Society of Japan

Author:

FUJII Takashi,AOKI Yoshitaka,FUSHIMI Koji,MAKINO Takeshi,ONO Shoji,HABAZAKI Hiroki

Publisher

The Surface Finishing Society of Japan

Subject

General Engineering

Reference18 articles.

1. 1) T. Makino, M. Shinohara, M. Furukawa and H. Uchi ; Proc. 113^th Annual Conf. SFSJ, p. 360 (2006) (in Japanese).

2. Fabrication of thin films with highly porous microstructures

3. Competitive growth of Ta nanopillars during glancing angle deposition: Effect of surface diffusion

4. The structure of Ta nanopillars grown by glancing angle deposition

5. Observations of the microscopic growth mechanism of pillars and helices formed by glancing-angle thin-film deposition

Cited by 1 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. 10.4139/sfj.62.324;Journal of The Surface Finishing Society of Japan;2011

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