Surface Patterning of Al Thin Film Using Photolithography and Anodization
Author:
Publisher
The Surface Finishing Society of Japan
Subject
General Engineering
Reference24 articles.
1. 1) S. Miyake and J. Kim ; JSPE, 65, 1788 (1999)(in Japanese).
2. 2) T. Hosono and H. Tokura ; JSPE, 71, 729 (2005)(in Japanese).
3. Control of Spatially Localized Chemical Reactions Using a Scanning Probe Microscope
Cited by 3 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. Surface Patterning for Decorative Purposes of Aluminum Plate using Photolithography-Anodization-Chemical Etching Process;Journal of The Surface Finishing Society of Japan;2012
2. Reactive Ion Etching of Quartz Substrates Using Three-dimensional Aluminum Masks;Journal of The Surface Finishing Society of Japan;2010
3. Reactive Ion Etching of Si Substrate using Three-Dimensional Aluminum Masks;Journal of the Vacuum Society of Japan;2009
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