Effects of RF power and bias voltage on formation of titanium nitride film by RF ion plating.-Reference-Cited by-同舟云学术

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Effects of RF power and bias voltage on formation of titanium nitride film by RF ion plating.

Published:1985 Issue:8 Volume:36 Page:330-334
ISSN:1884-3395
Container-title:Journal of the Metal Finishing Society of Japan
language:ja
Short-container-title:Journal of the Metal Finishing Society of Japan

Author:

NISHIDA Norihide,YOKOYAMA Fumio

Publisher

The Surface Finishing Society of Japan

Cited by 6 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Corrosion and Erosion-Corrosion of Ceramics and Functionally Gradient Material-Coated Steels in Erosion Environments;CORROSION;2000-06

2. Mixing of Oxygen in Titanium Nitride Films Formed by Reactive HCD Ion Plating;Journal of the Japan Institute of Metals;2000

3. Slurry erosion of plasma-sprayed ceramic coatings;Surface and Coatings Technology;1999-07

4. Slurry erosion properties of ceramic coatings and functionally gradient materials;Wear;1995-08

5. Characterisation of TiN films prepared by electron shower, arc ion-plating and sputtering methods;Advanced Materials for Optics and Electronics;1995-07

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