Radiation Exposure Reduction by Forming Oxide Film after Chemical Decontamination-Reference-Cited by-同舟云学术

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Radiation Exposure Reduction by Forming Oxide Film after Chemical Decontamination

Published:2012 Issue:5 Volume:63 Page:296
ISSN:0915-1869
Container-title:Journal of the Surface Finishing Society of Japan
language:en
Short-container-title:Journal of The Surface Finishing Society of Japan

Author:

NAGASE Makoto¹,HOSOKAWA Hideyuki²

Affiliation:

1. Hitachi-GE Nuclear Energy, Ltd.

2. Hitachi Research Laboratory, Hitachi, Ltd.

Publisher

The Surface Finishing Society of Japan

Subject

General Engineering

Link

https://www.jstage.jst.go.jp/article/sfj/63/5/63_296/_pdf

Reference13 articles.

1. 1) N. Usui, M. Fuse, H. Hosokawa, S. Uchida ; J. Nucl. Sci. Technol., 42, 75 (2005).

2. 2) M. Nagase, K. Ishida, N. Uetake, K. Anazawa, F. Nakamura, H. Yoshikawa, T. Tamagawa, K. Furukawa ; J. Nucl. Sci. Technol., 38, 1090 (2001).

3. 3) A. Miyazawa, T. Shibano, T. Sato, M. Shimura, K. Iida ; Symposium on Water Chemistry and Corrosion of Nuclear Power Plants in Asia, Gyeongju, Korea, p.38 (2005).

4. 4) R. L. Cowan, C. J. Wood ; 9^th International Conference on Water Chemistry in Nuclear Reactor Systems, Avignon, France, Paper 131 (2002).

5. 5) T. Honda, A. Minato, M. Izumiya, K. Ohsumi, H. Matsubayashi ; J. Nucl. Sci. Technol., 20, 871 (1983).

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