Integration of metal-organic frameworks into an electrochemical dielectric thin film for electronic applications-Reference-Cited by-同舟云学术

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Integration of metal-organic frameworks into an electrochemical dielectric thin film for electronic applications

Published:2016-06-10 Issue:1 Volume:7 Page:
ISSN:2041-1723
Container-title:Nature Communications
language:en
Short-container-title:Nat Commun

Author:

Li Wei-Jin,Liu Juan,Sun Zhi-Hua,Liu Tian-Fu,Lü Jian,Gao Shui-Ying,He Chao,Cao Rong,Luo Jun-Hua

Publisher

Springer Science and Business Media LLC

Subject

General Physics and Astronomy,General Biochemistry, Genetics and Molecular Biology,General Chemistry

Link

http://www.nature.com/articles/ncomms11830.pdf

Reference63 articles.

1. Ha, Y. G., Everaerts, K., Hersam, M. C. & Marks, T. J. Hybrid gate dielectric materials for unconventional electronic circuitry. Acc. Chem. Res. 47, 1019–1028 (2014).

2. Depas, M., Van Meirhaeghe, R. L., Laflère, W. H. & Cardon, F. Electrical characteristics of Al/SiO2/n-Si tunel diodes with an oxide layer grown by rapid thermal oxidation. Solid-State Electron 37, 433–441 (1994).

3. Nigro, R. L. et al. Praseodymium silicate as a high-k dielectric candidate: an insight into the Pr2O3-film/Si-substrate interface fabricated through a metal–organic chemical vapor deposition process. Adv. Funct. Mater. 15, 838–845 (2005).

4. DiBenedetto, S. A., Facchetti, A., Ratner, M. A. & Marks, T. J. Charge Conduction and Breakdown Mechanisms in Self-Assembled Nanodielectrics. J. Am. Chem. Soc. 131, 7158–7168 (2009).

5. Maliakal, A., Katz, H., Cotts, P. M., Subramoney, S. & Mirau, P. Inorganic oxide core, polymer shell nanocomposite as a high K gate dielectric for flexible electronics applications. J. Am. Chem. Soc. 127, 14655–14662 (2005).

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