Errors in the Measurement of Film Thickness by Multiple-Beam Interferometry-Reference-Cited by-同舟云学术

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Errors in the Measurement of Film Thickness by Multiple-Beam Interferometry

Published:1958-10 Issue:4643 Volume:182 Page:1149-1150
ISSN:0028-0836
Container-title:Nature
language:en
Short-container-title:Nature

Author:

WEAVER C.,BENJAMIN P.

Publisher

Springer Science and Business Media LLC

Subject

Multidisciplinary

Link

http://www.nature.com/articles/1821149b0.pdf

Reference4 articles.

1. Tolansky, S., “Multiple Beam Interferometry” (Clarendon Press, Oxford, 1948).

2. Scott, G. D., McLauchlan, T. A., and Sennett, R. S., J. App. Phys., 21, 843 (1950).

3. Benjamin, P., Ph.D. Thesis, University of Glasgow (1958).

4. Weaver, C., and Benjamin, P., J. Phys. Radium. (in the press).

Cited by 4 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Application of Fresnel diffraction from a phase step to the measurement of film thickness;Applied Optics;2009-10-01

2. Sputtering of Polycrystalline Copper and Silver by 30–170 keV Argon Ions;Journal of Applied Physics;1964-06

3. Preparation of Phase Diffraction Gratings by Vacuum Evaporation;Journal of the Optical Society of America;1960-01-01

4. Substrate Damage in Film Thickness Measurement by Beam Interferometry;Nature;1959-08

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