Reconfiguring nucleation for CVD growth of twisted bilayer MoS2 with a wide range of twist angles

Author:

Xu ManzhangORCID,Ji Hongjia,Zheng Lu,Li Weiwei,Wang Jing,Wang HanxinORCID,Luo Lei,Lu QianboORCID,Gan XuetaoORCID,Liu ZhengORCID,Wang XuewenORCID,Huang WeiORCID

Abstract

AbstractTwisted bilayer (TB) transition metal dichalcogenides (TMDCs) beyond TB-graphene are considered an ideal platform for investigating condensed matter physics, due to the moiré superlattices-related peculiar band structures and distinct electronic properties. The growth of large-area and high-quality TB-TMDCs with wide twist angles would be significant for exploring twist angle-dependent physics and applications, but remains challenging to implement. Here, we propose a reconfiguring nucleation chemical vapor deposition (CVD) strategy for directly synthesizing TB-MoS2 with twist angles from 0° to 120°. The twist angles-dependent Moiré periodicity can be clearly observed, and the interlayer coupling shows a strong relationship to the twist angles. Moreover, the yield of TB-MoS2 in bilayer MoS2 and density of TB-MoS2 are significantly improved to 17.2% and 28.9 pieces/mm2 by tailoring gas flow rate and molar ratio of NaCl to MoO3. The proposed reconfiguring nucleation approach opens an avenue for the precise growth of TB-TMDCs for both fundamental research and practical applications.

Publisher

Springer Science and Business Media LLC

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