Author:
Pawłowska Sandra,Gierowski Jakub,Stonio Bartłomiej,Juchniewicz Marcin,Ficek Mateusz,Kruczkowski Michał,Szczerska Małgorzata
Abstract
AbstractMirrors are used in optical sensors and measurement setups. This creates a demand for mirrors made of new materials and having various properties tailored to specific applications. In this work, we propose silicon covered with a thin silicon nitride layer as a mirror for near-infrared measurements. SiN layer was deposited on a standard silicon wafer with a Low-Pressure Chemical Vapor Deposition furnace. Then, the created layer was investigated using ellipsometry and scanning electron microscope. Subsequently, the mirror was used as a reflecting surface in a Fabry–Perot fiber-optic interferometer. The mirror performance was investigated for wavelengths used in telecomunication (1310 nm and 1550 nm) and then compared with results obtained with the same measurement setup, with a silver mirror instead of silicon covered with SiN, as reference. Results showed that the proposed mirror can replace the silver one with satisfying results for investigated wavelengths.
Funder
Fundacja na rzecz Nauki Polskiej
Politechnika Gdańska
Publisher
Springer Science and Business Media LLC
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