Author:
Schube Jörg,Höhn Oliver,Schygulla Patrick,Müller Ralph,Jahn Mike,Mikolasch Gabriele,Steiner Marc,Predan Felix,Bartsch Jonas,Dimroth Frank,Clement Florian,Keding Roman
Abstract
AbstractLow-cost approaches for mass production of III–V-based photovoltaics are highly desired today. For the first time, this work presents industrially relevant mask and plate for front metallization of III–V-based solar cells replacing expensive photolithography. Metal contacts are fabricated by nickel (Ni) electroplating directly onto the solar cell’s front using a precisely structured mask. Inkjet printing offers low-cost and high-precision processing for application of an appropriate plating resist. It covers the solar cell’s front side with narrow openings for subsequent electroplating. The width of the resulting Ni contacts is as low as (10.5 ± 0.8) µm with sharp edges and homogenous shape. The 4 cm2-sized champion III–V-on-silicon triple-junction solar cell with mask and plate front metallization reaches a certified conversion efficiency η of (31.6 ± 1.1) % (AM1.5 g spectrum). It performs just as well as the reference sample with photolithography-structured evaporated front contacts, which reaches η = (31.4 ± 1.1) %.
Funder
Bundesministerium für Wirtschaft und Klimaschutz
Fraunhofer-Institut für Solare Energiesysteme ISE
Publisher
Springer Science and Business Media LLC
Cited by
3 articles.
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