Author:
Inaba Yoshimi,Asama Hideo
Abstract
AbstractA self-organizing structure is important for imparting functions and simplifying the manufacturing process. The development of spontaneous structures with a roll-to-roll process capability is a challenging task. We propose a novel patterning method utilizing the destruction of the emulsion structure. An oil-in-water (O/W) UV-curable emulsion liquid film was partially exposed to UV, resulting in aggregation and immobilization of the emulsion in the medium. Emulsion droplets in the unexposed area are coalesced by removing water. Coalesced emulsion droplets expand and spontaneously permeate into the pores formed in the aggregated structure of UV-cured emulsion particles, causing an uneven structure. An uneven pattern can be formed by direct UV exposure of the liquid film and the subsequent drying process without requiring a development process.
Publisher
Springer Science and Business Media LLC
Reference33 articles.
1. Kato, T. et al. Self-organization and functional materials. In Advanced Materials System One Point 3, 1–2 (The Society of Polym. Sci. Japan, 2012).
2. Yager, K. G. & Barrett, C. J. All-optical patterning of azo polymer films. Curr. Opin. Solid State Mater. Sci. 5, 487–494 (2001).
3. Viswanathan, N. K. et al. Surface relief structures on azo polymer films. J. Mater. Chem. 9, 1941–1955 (1999).
4. Aoki, K. & Ichimura, K. Self-developable surface relief photoimaging generated by anionic UV-curing of epoxy resins. Polym. J. 41, 988–992 (2009).
5. Isayama, J., Nagano, S. & Seki, T. Phototriggered mass migrating motions in liquid crystalline azobenzene polymer films with systematically varied thermal properties. Macromolecules 43, 4105–4112 (2010).
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