Highly conductive and transparent gallium doped zinc oxide thin films via chemical vapor deposition

Abstract

AbstractDegenerately doped ZnO is seen as a potential substitute to the ubiquitous and expensive Sn doped In2O3 as a transparent electrode in optoelectronic devices. Here, highly conductive and transparent Ga doped ZnO thin films were grown via aerosol assisted chemical vapor deposition. The lowest resistivity (7.8 × 10−4 Ω.cm) and highest carrier concentration (4.23 × 1020 cm−3) ever reported for AACVD grown ZnO: Ga was achieved due to using oxygen poor growth conditions enabled by diethylzinc and triethylgallium precursors.