Facile large-area uniform photolithography of membrane diffractive lens based on vacuum assisted self contact method

Abstract

AbstractOptical polyimide (PI) membrane is a promising substrate material for diffractive lens applied in future large-aperture space based imaging system because of its light weight, environmental adaptability and deployable feature. In this letter, we put forward a facile large-area uniform photolithography technique using vacuum assisted self contact method to fabricate large-aperture membrane diffractive lens. We fabricated a φ 400 mm aperture membrane off-axis 2-levels Fresnel Zone Lens (FZL) based on the method and achieved uniformly distributed photoresist morphology as well as over 36.6% average diffraction efficiency in full aperture. The results demonstrated that vacuum assisted self contact method effectively eliminates considerable air gaps caused by unevenness of large area photomask and substrate, thus facilitates uniform light field distribution in photoresist. This work provides reference to fabrication techniques of large aperture membrane diffractive lens, and offers feasible methods for future large area flexible electronics manufacturing.