Author:
Wang Rongguang,Li Yunhui,Xiao Tian,Cong Li,Ling Yunhan,Lu Zhaoxia,Fukushima Chiharu,Tsuchitori Isao,Bazzaoui Mohammed
Abstract
Abstract
Employing atomic force microscopy (AFM) to measure passive film thickness on stainless steel (SS) in aqueous solution is proposed. SUS304 austenite and SUS329J4L duplex SS samples partly covered by gold were set in a minicell. To remove the original film, the SS surface but gold was etched using dilute sulfuric acid. After cleaning, open circuit potential (OCP), and distance from the sample surface to the top of the gold were measured. They were then immersed in either 1.0% NaCl; 5.0% NaCl; or aqueous solution with pH ranging from 1.0 to 10.0 and measured again. Differences between the first and subsequent measures of OCP suggested a passive film had formed in solution with pH ranging from 2.8 to 10.0. Similarly, differences among AFM measures revealed the observed film thickness increased with increase in pH and with decrease in chloride ions. Also, film thickness in water was greater than that in a vacuum. Comparison of AFM measurements of passive film on the austenite and sigma phases in sensitized SUS329J4L duplex SS revealed the film was thinner on the sigma phase containing more chromium. Taken together, these findings suggest the proposed method is applicable for measuring the thickness of passive films in aqueous solution.
Funder
MEXT | Japan Society for the Promotion of Science
Publisher
Springer Science and Business Media LLC
Cited by
16 articles.
订阅此论文施引文献
订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献