1. Das, S., Jana, S., Das, N., Ghosh, S. S. & Biswas, P. K. Study of spin coated multilayer zirconia and silica films for non-quarterwavelength optical design based antireflection effect at 1,054 nm. Journal of Sol-Gel Science and Technology 60(2), 116–124 (2011).
2. Park, H. et al. Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical‐frustum arrays. Advanced Materials 23(48), 5796–5800 (2011).
3. Thomas, I. M. Method for the preparation of porous silica antireflection coatings varying in refractive index from 1.22 to 1.44. Appl. Opt. 31(28), 6145–9 (1992).
4. Jansen, H., Boer, M. D., Burger, J., Legtenberg, R. & Elwenspoek, M. The black silicon method II: The effect of mask material and loading on the reactive ion etching of deep silicon trenches. International Conference on Micro- and Nano- Engineering. Elsevier Science Publishers B. V. 27, 475–480 (1995).
5. Ruby, D. S., Zaidi, S. H., Narayanan, S. & Bathey, B. RIE-texturing of industrial multicrystalline silicon solar cells. Photovoltaic Specialists Conference. Conference Record of the Twenty-Ninth IEEE 127, 146–149 (2003).