Low T direct plasma assisted growth of graphene on sapphire and its integration in graphene/MoS2 heterostructure-based photodetectors

Author:

Muñoz R.ORCID,López-Elvira E.,Munuera C.ORCID,Carrascoso F.,Xie Y.ORCID,Çakıroğlu O.,Pucher T.ORCID,Puebla S.ORCID,Castellanos-Gomez A.ORCID,García-Hernández M.

Abstract

AbstractWe report on outstanding photo-responsivity, R > 103 A/W, fast response (~0.1 s), and broadband sensitivity ranging from the UV to the NIR in two terminal graphene/MoS2 photodetectors. Our devices are based on the deterministic transfer of MoS2 on top of directly grown graphene on sapphire, and their performance outperforms previous similar photodetectors using large-scale grown graphene. Here we devise a protocol for the direct growth of transparent (transmittance, Tr > 90%), highly conductive (sheet resistance, R < 1 kΩ) uniform and continuous graphene films on sapphire at 700 °C by using plasma-assisted chemical vapor deposition (CVD) with C2H2/H2 gas mixtures. Our study demonstrates the successful use of plasma-assisted low-temperature CVD techniques to directly grow graphene on insulators for optoelectronic applications.

Publisher

Springer Science and Business Media LLC

Subject

Mechanical Engineering,Mechanics of Materials,Condensed Matter Physics,General Materials Science,General Chemistry

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