Tantalum and Tantalum Compounds in Thin Film Microcircuitry-Reference-Cited by-同舟云学术

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Tantalum and Tantalum Compounds in Thin Film Microcircuitry

Published:1966 Issue:1 Volume:34 Page:1-11
ISSN:0013-4678
Container-title:Journal of The Electrochemical Society of Japan
language:en
Short-container-title:J. Electrochem. Soc. Jpn

Author:

MCLEAN David A.

Publisher

The Electrochemical Society of Japan

Link

https://www.jstage.jst.go.jp/article/jesj/34/1/34_1/_pdf

Cited by 8 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Superconducting properties of CVD tantalum films;Materials Letters;1987-12

2. Analysis of sputtering discharge by optical and mass spectrometry. II. Platinum and tantalum sputtered in argon/nitrogen mixtures;Journal of Applied Physics;1973-06

3. Factors controlling the structure of sputtered Ta films;Thin Solid Films;1973-05

4. Structure and electrical properties of Ta films sputtered in ArO2;Thin Solid Films;1972-04

5. Structure and Composition of Sputtered Tantalum Thin Films on Silicon Studied by Nuclear and X‐Ray Analysis;Journal of Applied Physics;1972-04

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