Spectrometry of x-ray induced emission in sputtering deposition: a new technique for in situ thin-film chemical analysis
Author:
Publisher
American Chemical Society (ACS)
Subject
Analytical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ac00130a014
Cited by 20 articles. 订阅此论文施引文献 订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献
1. In situ and ex situ characterization of thin films by soft X-ray emission spectroscopy;Journal of Electron Spectroscopy and Related Phenomena;2000-10
2. Simulations of reactive sputtering with constant voltage power supply;Journal of Applied Physics;1998-12
3. Studies of reactive sputtering of multi-phase chromium nitride;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-03
4. In situ diagnostic studies of reactive co-sputtering from two targets by means of soft x-ray and optical emission spectroscopy;Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films;1997-01
5. Probe depth variation in grazing exit soft-X-ray emission spectroscopy;Nuclear Instruments and Methods in Physics Research Section A: Accelerators, Spectrometers, Detectors and Associated Equipment;1997-01
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