Island Formation at the Initial Stages of Epitaxial ZnS Films Grown by Single Source Chemical Vapor Deposition
Author:
Affiliation:
1. Surface Science and Technology, School of Chemistry, University Of New South Wales, Sydney NSW 2052, Australia
Publisher
American Chemical Society (ACS)
Subject
Materials Chemistry,Surfaces, Coatings and Films,Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp012955p
Reference15 articles.
1. Epitaxial ZnS Thin Films Grown by Single Source Chemical Vapor Deposition
2. Single source chemical vapour deposition of zinc sulphide thin films
3. Ideal hydrogen termination of the Si (111) surface
4. Mechanism of HF etching of silicon surfaces: A theoretical understanding of hydrogen passivation
5. Effect of Surface Treatments after HF Etching on Oxidation of Si
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