Feed-Rate-Limited Aerosol-Assisted Chemical Vapor Deposition of CdxZn1-xS and ZnS:Mn with Composition Control-Reference-Cited by-同舟云学术

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Feed-Rate-Limited Aerosol-Assisted Chemical Vapor Deposition of CdxZn1-xS and ZnS:Mn with Composition Control

Published:1998-02-26 Issue:3 Volume:10 Page:914-921
ISSN:0897-4756
Container-title:Chemistry of Materials
language:en
Short-container-title:Chem. Mater.

Author:

Nyman M.,Jenkins K.,Hampden-Smith M. J.,Kodas T. T.,Duesler E. N.,Rheingold A. L.,Liable-Sands M. L.

Publisher

American Chemical Society (ACS)

Subject

Materials Chemistry,General Chemical Engineering,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cm9706816

Reference27 articles.

1. Hovel, H. J.SemiconductorsandSemimetals; Academic: New York, 1975; Vol. 11.

2. ZnS , CdS , and Zn1 − x Cd x S Thin Films Deposited by the Successive Ionic Layer Adsorption and Reaction Process

3. Influence of Mn doping conditions on electroluminescent characteristics of ZnS:Mn thin-film electroluminescent (TFEL) devices using insulating ceramic

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