A Diode Laser Study of the Product Branching Ratios of the CH + NO2 Reaction
Author:
Affiliation:
1. Department of Chemistry, North Dakota State University, Fargo, North Dakota 58105
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp981362k
Reference43 articles.
1. Mechanism and modeling of nitrogen chemistry in combustion
2. Temperature dependence of the reactions of CH radicals with NO, NH3 and N2O in the range 200–1300 K
3. Absolute rate constants for the reactions of CH(X2II) with NO, N2O, NO2 and N2 at room temperature
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