High-Throughput Screening Using Porous Photoelectrode for the Development of Visible-Light-Responsive Semiconductors-Reference-Cited by-同舟云学术

High-Throughput Screening Using Porous Photoelectrode for the Development of Visible-Light-Responsive Semiconductors

Published:2007-06-16 Issue:4 Volume:9 Page:574-581
ISSN:1520-4766
Container-title:Journal of Combinatorial Chemistry
language:en
Short-container-title:J. Comb. Chem.

Author:

Arai Takeo¹,Konishi Yoshinari¹,Iwasaki Yasukazu¹,Sugihara Hideki¹,Sayama Kazuhiro¹

Affiliation:

1. Energy Technology Research Institute, National Institute of Advanced Industrial Science and Technology (AIST), Central 5, 1-1-1 Higashi, Tsukuba, Ibaraki 305-8565, Japan, and Nissan Research Center, Nissan Motor Co., Ltd., 1 Natsushima, Yokosuka, Kanagawa 237-8523, Japan

Publisher

American Chemical Society (ACS)

Subject

General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cc0700142

Reference30 articles.

1. Electrochemical Photolysis of Water at a Semiconductor Electrode

2. Direct splitting of water under visible light irradiation with an oxide semiconductor photocatalyst

3. Photo- and Mechano-Catalytic Overall Water Splitting Reactions to Form Hydrogen and Oxygen on Heterogeneous Catalysts

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