Heavy Ketones, the Heavier Element Congeners of a Ketone
Author:
Affiliation:
1. Department of Chemical and Biological Sciences, Faculty of Science, Japan Women's University, Bunkyo-ku, Tokyo 112-8681, Japan, and Institute for Fundamental Research of Organic Chemistry, Kyushu University, Higashi-ku, Fukuoka 812-8581, Japan
Publisher
American Chemical Society (ACS)
Subject
General Medicine,General Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/ar980073b
Reference41 articles.
1. Repulsive Forces in Relation to Bond Energies, Distances and Other Properties
2. Synthesis of mesityldiphenylmethylenephosphine: a stable compound with a localized phosphorus:carbon bond
3. A solid silaethene: isolation and characterization
4. Synthesis and structure of bis(2,4,6-tri-tert-butylphenyl)diphosphene: isolation of a true phosphobenzene
5. Tetramesityldisilene, a Stable Compound Containing a Silicon-Silicon Double Bond
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