Improved Photoreaction Yields for Soft Ultraviolet Photolithography in Organothiol Self-Assembled Monolayers-Reference-Cited by-同舟云学术

Improved Photoreaction Yields for Soft Ultraviolet Photolithography in Organothiol Self-Assembled Monolayers

Published:2009-11-04 Issue:52 Volume:113 Page:21642-21647
ISSN:1932-7447
Container-title:The Journal of Physical Chemistry C
language:en
Short-container-title:J. Phys. Chem. C

Author:

Prompinit Panida¹,Achalkumar Ammathnadu S.¹,Han Xiaojun¹,Bushby Richard J.¹,Wälti Christoph¹,Evans Stephen D.¹

Affiliation:

1. Molecular and Nanoscale Physics, School of Physics and Astronomy, University of Leeds, Leeds LS2 9JT, U.K., Self-Organizing Molecular Systems (SOMS) Centre, University of Leeds, Leeds LS2 9JT, U.K.and Institute of Microwaves and Photonics, School of Electronic and Electrical Engineering, University of Leeds, Leeds LS2 9JT, U.K.

Publisher

American Chemical Society (ACS)

Subject

Surfaces, Coatings and Films,Physical and Theoretical Chemistry,General Energy,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/jp907950c

Reference32 articles.

1. Deep UV Photochemistry of Chemisorbed Monolayers: Patterned Coplanar Molecular Assemblies

2. Photooxidation of thiols in self-assembled monolayers on gold

3. UV photopatterning of alkanethiolate monolayers self-assembled on gold and silver

4. Oxidation of Self-Assembled Monolayers by UV Light with a Wavelength of 254 nm

5. Photooxidation of Self-Assembled Monolayers by Exposure to Light of Wavelength 254 nm: A Static SIMS Study

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