The 193 and 248 nm Photodissociation of CF3C(O)Cl-Reference-Cited by-同舟云学术

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The 193 and 248 nm Photodissociation of CF3C(O)Cl

Published:1995-03 Issue:13 Volume:99 Page:4554-4557
ISSN:0022-3654
Container-title:The Journal of Physical Chemistry
language:en
Short-container-title:J. Phys. Chem.

Author:

Maricq M. Matti,Szente Joseph J.

Publisher

American Chemical Society (ACS)

Subject

Physical and Theoretical Chemistry,General Engineering

Link

https://pubs.acs.org/doi/pdf/10.1021/j100013a028

Cited by 14 articles. 订阅此论文施引文献订阅此论文施引文献，注册后可以免费订阅5篇论文的施引文献，订阅后可以查看论文全部施引文献

1. Electron-triggered processes in halogenated carboxylates: dissociation pathways in CF₃COCl and its clusters;Physical Chemistry Chemical Physics;2024

2. On the Wavelength-Dependent Photochemistry of the Atmospheric Molecule CF₃COCl;ACS Earth and Space Chemistry;2023-10-16

3. Photo-dissociation mechanism of trifluoroacetyl chloride in the gas phase: AIMS dynamic simulations;The Journal of Chemical Physics;2021-06-28

4. Gas-phase photodissociation of CF3C(O)Cl between 193 and 280 nm;Chemical Physics Letters;2015-10

5. Photoexcitation, Photoionization, and Photofragmentantion of CF3CF2CF2C(O)Cl Using Synchrotron Radiation between 13 and 720 eV;The Journal of Physical Chemistry A;2015-02-25

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