Size Effects on Photodissociation and Caging of Hydrogen Bromide Inside or on the Surface of Large Inert Clusters: From One to Three Icosahedral Argon Layers
Author:
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry
Link
https://pubs.acs.org/doi/pdf/10.1021/jp001262q
Reference35 articles.
1. Some remarks about free radicals and the photochemistry of solutions
2. Molecular Photodynamics in Rare Gas Solids
3. Study of the total and partial fragmentation dynamics of Ar–HCl after uv photodissociation
4. Resonances in the photodissociation of HCl in the Ar–HCl van der Waals complex: How prominent are they?
5. Resonances from short time complex-scaled cross-correlation probability amplitudes by the filter-diagonalization method
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