Acid–Base Reaction-Assisted Quantum Dot Patterning via Ligand Engineering and Photolithography-Reference-Cited by-同舟云学术

Acid–Base Reaction-Assisted Quantum Dot Patterning via Ligand Engineering and Photolithography

Published:2022-10-18 Issue:42 Volume:14 Page:47831-47840
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Bae Jung Ho¹^ORCID,Kim Suhyeon²,Ahn Junhyuk¹,Shin Chanho³,Jung Byung Ku¹,Lee Yong Min⁴,Hong Yun Kun⁵,Kim Woosik¹,Ha Don Hyung⁵^ORCID,Ng Tse Nga³^ORCID,Kim Jiwan²^ORCID,Oh Soong Ju¹^ORCID

Affiliation:

1. Department of Materials Science and Engineering, Korea University, Seoul02841, Republic of Korea

2. Department of Advanced Materials Engineering, Kyonggi University, Suwon-si, Gyeonggi-do16227, Republic of Korea

3. Materials Science Engineering Program and Department of Electrical and Computer Engineering, University of California San Diego, La Jolla, California92093,United States

4. Department of Semiconductor Systems Engineering, Korea University, Seoul02841, Republic of Korea

5. School of Integrative Engineering, Chung-Ang University, Seoul06974, Republic of Korea

Funder

Ministry of Science and ICT, South Korea

Ministry of Trade, Industry and Energy

Korea Institute for Advancement of Technology

Ministry of Science, ICT and Future Planning

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

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