Hierarchical, Self-Assembled Metasurfaces via Exposure-Controlled Reflow of Block Copolymer-Derived Nanopatterns
Author:
Affiliation:
1. Center for Functional Nanomaterials, Brookhaven National Laboratory, Upton, New York 11973, United States
Publisher
American Chemical Society (ACS)
Subject
General Materials Science
Link
https://pubs.acs.org/doi/pdf/10.1021/acsami.2c05911
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