Ultrafast Degradation and High Adsorption Capability of a Sulfur Mustard Simulant under Ambient Conditions Using Granular UiO-66-NH<sub>2</sub> Metal

Ultrafast Degradation and High Adsorption Capability of a Sulfur Mustard Simulant under Ambient Conditions Using Granular UiO-66-NH₂ Metal–Organic Gels

Published:2022-05-12 Issue:20 Volume:14 Page:23383-23391
ISSN:1944-8244
Container-title:ACS Applied Materials & Interfaces
language:en
Short-container-title:ACS Appl. Mater. Interfaces

Author:

Zhou Chuan¹,Yuan Bo¹,Zhang Shouxin¹,Yang Guang¹,Lu Lin¹,Li Heguo¹,Tao Cheng-an²^ORCID

Affiliation:

1. State Key Laboratory of NBC Protection for Civilian, Beijing 102205, PR China

2. College of Liberal Arts and Science, National University of Defense Technology, Changsha 410073, China

Funder

National Natural Science Foundation of China

Huxiang Young Talent Project

Publisher

American Chemical Society (ACS)

Subject

General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/acsami.2c02401

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