Adsorption and Reactivity of NO and N2O on Cu{110}: Combined RAIRS and Molecular Beam Studies
Author:
Affiliation:
1. Department of Chemistry, University of Cambridge, Lensfield Road, Cambridge, CB2 1EW, U.K.
2. IRC in Surface Science, University of Liverpool, P.O. Box 147, Oxford Street, Liverpool, L69 3BX, U.K.
Publisher
American Chemical Society (ACS)
Subject
Physical and Theoretical Chemistry,General Engineering
Link
https://pubs.acs.org/doi/pdf/10.1021/jp9602888
Reference25 articles.
1. Very Low Temperature Surface Reaction: N2O Formation from NO Dimers at 70 to 90 K on Ag{111}
2. Characterization and orientation of adsorbed NO dimers on Ag{111} at low temperatures
3. Isotopic studies of the reaction of NO on silver surfaces
4. Study of the interaction of nitric oxide with Cu(100) and Cu(111) surfaces using low energy electron diffraction and electron spectroscopy
5. Adsorption of nitric oxide on Cu(100) surfaces; an electron spectroscopic study
Cited by 70 articles. 订阅此论文施引文献 订阅此论文施引文献,注册后可以免费订阅5篇论文的施引文献,订阅后可以查看论文全部施引文献
1. First-Principles Microkinetic Study of NO Reduction on Cu Catalysts;The Journal of Physical Chemistry C;2023-09-26
2. NO Reduction on Cu‐Based Model Catalysts Studied by in‐situ IRAS;Chinese Journal of Chemistry;2022-02-28
3. Partial reduction of NO to N2O on Cu{311}: role of intermediate N2O2;Catalysis Science & Technology;2022
4. Adsorption and valence electronic states of nitric oxide on metal surfaces;Surface Science Reports;2021-03
5. Theoretical Study of NO Dissociative Adsorption onto 3d Metal Particles M55 (M = Fe, Co, Ni, and Cu): Relation between the Reactivity and Position of the Metal Element in the Periodic Table;ACS Omega;2021-02-10
1.学者识别学者识别
2.学术分析学术分析
3.人才评估人才评估
"同舟云学术"是以全球学者为主线,采集、加工和组织学术论文而形成的新型学术文献查询和分析系统,可以对全球学者进行文献检索和人才价值评估。用户可以通过关注某些学科领域的顶尖人物而持续追踪该领域的学科进展和研究前沿。经过近期的数据扩容,当前同舟云学术共收录了国内外主流学术期刊6万余种,收集的期刊论文及会议论文总量共计约1.5亿篇,并以每天添加12000余篇中外论文的速度递增。我们也可以为用户提供个性化、定制化的学者数据。欢迎来电咨询!咨询电话:010-8811{复制后删除}0370
www.globalauthorid.com
TOP
Copyright © 2019-2024 北京同舟云网络信息技术有限公司 京公网安备11010802033243号 京ICP备18003416号-3