Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates-Reference-Cited by-同舟云学术

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Hole-Mask Colloidal Nanolithography for Large-Area Low-Cost Metamaterials and Antenna-Assisted Surface-Enhanced Infrared Absorption Substrates

Published:2011-12-29 Issue:1 Volume:6 Page:979-985
ISSN:1936-0851
Container-title:ACS Nano
language:en
Short-container-title:ACS Nano

Author:

Cataldo Stefano¹,Zhao Jun¹,Neubrech Frank²,Frank Bettina¹,Zhang Chunjie³,Braun Paul V.³,Giessen Harald¹

Affiliation:

1. 4. Physics Institute and Research Center SCoPE, Pfaffenwaldring 57, University of Stuttgart, 70569 Stuttgart, Germany

2. Kirchhoff Institute for Physics, University of Heidelberg, Im Neuenheimer Feld 227, 69120 Heidelberg, Germany

3. Department of Materials Science and Engineering, University of Illinois at Urbana−Champaign, Urbana, Illinois 61801, United States.

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

Link

https://pubs.acs.org/doi/pdf/10.1021/nn2047982

Reference27 articles.

1. Wavelength-Scanned Surface-Enhanced Raman Excitation Spectroscopy

2. How Gold Nanoparticles Have Stayed in the Light: The 3Mʼs Principle

3. The Ring: A Leitmotif in Plasmonics

4. Tunability of Subradiant Dipolar and Fano-Type Plasmon Resonances in Metallic Ring/Disk Cavities: Implications for Nanoscale Optical Sensing

5. Surface enhanced infrared absorption (SEIRA) spectroscopy on nanoshell aggregate substrates

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