Reactive Sputtering Deposition of Perovskite Oxide and Oxynitride Lanthanum Titanium Films: Structural and Dielectric Characterization-Reference-Cited by-同舟云学术

Reactive Sputtering Deposition of Perovskite Oxide and Oxynitride Lanthanum Titanium Films: Structural and Dielectric Characterization

Published:2013-10-17 Issue:11 Volume:13 Page:4852-4858
ISSN:1528-7483
Container-title:Crystal Growth & Design
language:en
Short-container-title:Crystal Growth & Design

Author:

Lu Yu¹,Le Paven Claire¹,Nguyen Hung V.¹²,Benzerga Ratiba¹,Le Gendre Laurent¹,Rioual Stéphane³,Tessier Franck⁴,Cheviré François⁴,Sharaiha Ala¹,Delaveaud Christophe²,Castel Xavier¹

Affiliation:

1. Institut d’Electronique et de Télécommunications de Rennes (IETR, UMR-CNRS 6164), Equipe Matériaux Fonctionnels, IUT de Saint Brieuc, Université de Rennes 1, 18 rue Henri Wallon, 22000 Saint Brieuc, France

2. CEA LETI, Minatec Campus, 38054 Grenoble, France

3. Laboratoire de Magnétisme de Brest (EA CNRS 4522), Université de Bretagne Occidentale, 29000 Brest, France

4. Institut des Sciences Chimiques de Rennes (ISCR, UMR-CNRS 6226), Equipe Verres et Céramiques, Université de Rennes 1, 35000 Rennes, France

Publisher

American Chemical Society (ACS)

Subject

Condensed Matter Physics,General Materials Science,General Chemistry

Link

https://pubs.acs.org/doi/pdf/10.1021/cg4010196

Reference26 articles.

1. Ternary and higher order rare-earth nitride materials: synthesis and characterization of ionic-covalent oxynitride powders

2. Pulsed laser deposition and characterisation of perovskite-type LaTiO3−xNx thin films