Controlling the Plasmonic Properties of Ultrathin TiN Films at the Atomic Level-Reference-Cited by-同舟云学术

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Controlling the Plasmonic Properties of Ultrathin TiN Films at the Atomic Level

Published:2018-05-11 Issue:7 Volume:5 Page:2816-2824
ISSN:2330-4022
Container-title:ACS Photonics
language:en
Short-container-title:ACS Photonics

Author:

Shah Deesha¹,Catellani Alessandra²,Reddy Harsha¹^ORCID,Kinsey Nathaniel³,Shalaev Vladimir¹,Boltasseva Alexandra¹^ORCID,Calzolari Arrigo²^ORCID

Affiliation:

1. School of Electrical and Computer Engineering and Birck Nanotechnology Center, Purdue University, West Lafayette, Indiana 47907, United States

2. CNR-NANO Istituto Nanoscienze, Centro S3, I-41125 Modena, Italy

3. School of Electrical and Computer Engineering, Virginia Commonwealth University, Richmond, Virginia 23220, United States

Funder

Division of Materials Research

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Biotechnology,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsphotonics.7b01553

Reference61 articles.

1. Planar Photonics with Metasurfaces

2. Biosensing with plasmonic nanosensors

3. Mid-infrared plasmonic biosensing with graphene

4. Nonlinear Plasmonic Sensing

5. Plasmonics for improved photovoltaic devices

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