Enabling High Precision Gradient Index Control in Subsurface Multiphoton Lithography-Reference-Cited by-同舟云学术

Enabling High Precision Gradient Index Control in Subsurface Multiphoton Lithography

Published:2023-03-29 Issue:9 Volume:10 Page:3008-3019
ISSN:2330-4022
Container-title:ACS Photonics
language:en
Short-container-title:ACS Photonics

Author:

Littlefield Alexander J.¹²^ORCID,Xie Dajie³⁴⁵^ORCID,Richards Corey A.³⁴⁵^ORCID,Ocier Christian R.³⁴⁵,Gao Haibo³⁴⁵^ORCID,Messinger Jonah F.⁴⁵⁶^ORCID,Ju Lawrence¹²,Gao Jingxing¹²^ORCID,Edwards Lonna¹²,Braun Paul V.²³⁴⁵⁷^ORCID,Goddard Lynford L.¹²⁵^ORCID

Affiliation:

1. Department of Electrical and Computer Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

2. Nick Holonyak, Jr., Micro and Nanotechnology Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

3. Department of Materials Science and Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

4. Materials Research Laboratory, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

5. Beckman Institute for Advanced Science and Technology, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

6. Department of Physics, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

7. Department of Mechanical Science and Engineering, University of Illinois Urbana-Champaign, Urbana, Illinois 61801, United States

Funder

Basic Energy Sciences

U.S. Department of Defense

Division of Electrical, Communications and Cyber Systems

University of Illinois at Urbana-Champaign

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Biotechnology,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsphotonics.2c01950

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