Concurrent Optimization of Diffraction Fields from Binary Phase Mask for Three-Dimensional Nanopatterning-Reference-Cited by-同舟云学术

Concurrent Optimization of Diffraction Fields from Binary Phase Mask for Three-Dimensional Nanopatterning

Published:2022-10-13 Issue: Volume: Page:
ISSN:2330-4022
Container-title:ACS Photonics
language:en
Short-container-title:ACS Photonics

Author:

Lee Chihun¹,Chang Gunho²,Kim Jaekyung¹,Hyun Gayea²,Bae Gwangmin²,So Sunae¹³^ORCID,Yun Jooyeong¹,Seong Junhwa¹,Yang Younghwan¹,Park Dong Yong⁴,Jeon Seokwoo²⁵^ORCID,Rho Junsuk¹⁶⁷⁸^ORCID

Affiliation:

1. Department of Mechanical Engineering, Pohang University of Science and Technology (POSTECH), Pohang37673, Republic of Korea

2. Department of Materials Science and Engineering, Korea Advanced Institute of Science and Technology (KAIST), Daejeon34141, Republic of Korea

3. Graduate School of Artificial Intelligence, Pohang University of Science and Technology (POSTECH), Pohang37673, Republic of Korea

4. Smart Manufacturing Technology R&D Group, Korea Institute of Industrial Technology (KITECH), Daegu42994, Republic of Korea

5. KAIST Institute for NanoCentury (KINC), KAIST, Daejeon34141, Republic of Korea

6. Department of Chemical Engineering, Pohang University of Science and Technology (POSTECH), Pohang37673, Republic of Korea

7. POSCO-POSTECH-RIST Convergence Research Center for Flat Optics and Metaphotonics, Pohang37673, Republic of Korea

8. National Institute of Nanomaterials Technology (NINT), Pohang37673, Republic of Korea

Funder

National Research Foundation of Korea

Ministry of Science, ICT and Future Planning

Korea Institute of Industrial Technology

Chung Mong-Koo Foundation

POSCO

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Biotechnology,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsphotonics.2c01324

Reference38 articles.

1. Fabricating complex three-dimensional nanostructures with high-resolution conformable phase masks

2. High‐Contrast Optical Modulation from Strain‐Induced Nanogaps at 3D Heterogeneous Interfaces

3. Fundamental principles and development of proximity-field nanopatterning toward advanced 3D nanofabrication

4. The Talbot effect: recent advances in classical optics, nonlinear optics, and quantum optics

5. Talbot effect immersion lithography by self-imaging of very fine grating patterns

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