Chemical Interface Damping-Induced Attenuation of Surface Plasmon-Enhanced Raman Spectroscopy-Reference-Cited by-同舟云学术

Chemical Interface Damping-Induced Attenuation of Surface Plasmon-Enhanced Raman Spectroscopy

Published:2022-09-09 Issue:9 Volume:9 Page:3000-3011
ISSN:2330-4022
Container-title:ACS Photonics
language:en
Short-container-title:ACS Photonics

Author:

Zhu Shuyi¹²,Zhao Qian¹,Fu Hao¹²,Zhang Hongwen¹^ORCID,Bao Haoming¹^ORCID,Le Zhou¹,Bao Xiaotian³⁴,Liu Xinfeng³⁴^ORCID,Zhang Tao¹,Li Yue¹^ORCID,Cai Weiping¹²^ORCID

Affiliation:

1. Key Lab of Materials Physics, Anhui Key Lab of Nanomaterials and Nanotechnology, Institute of Solid State Physics, HFIPS, Chinese Academy of Sciences, Hefei 230031, P. R. China

2. University of Science and Technology of China, Hefei 230026, P. R. China

3. CAS Key Lab of Standardization and Measurement for Nanotechnology, CAS Center for Excellence in Nanoscience, National Center for Nanoscience and Technology, Beijing 100190, P. R. China

4. University of Chinese Academy of Sciences, Beijing 100049, P. R. China

Funder

Ministry of Science and Technology of the People's Republic of China

National Natural Science Foundation of China

CAS/SAF International Partnership Program for Creative Research Teams

Publisher

American Chemical Society (ACS)

Subject

Electrical and Electronic Engineering,Atomic and Molecular Physics, and Optics,Biotechnology,Electronic, Optical and Magnetic Materials

Link

https://pubs.acs.org/doi/pdf/10.1021/acsphotonics.2c00685

Reference47 articles.