Robust Spin Interconnect with Isotropic Spin Dynamics in Chemical Vapor Deposited Graphene Layers and Boundaries
Author:
Affiliation:
1. Department of Microtechnology and Nanoscience, Chalmers University of Technology, SE-41296, Göteborg, Sweden
2. K.U. Leuven, 3001 Leuven, Belgium
3. Graphene center, Chalmers University of Technology, SE-41296, Göteborg, Sweden
Funder
Vetenskapsr?det
Chalmers Tekniska H?gskola
VINNOVA
H2020 Future and Emerging Technologies
Grafencentrum, Chalmers Tekniska H?gskola
Publisher
American Chemical Society (ACS)
Subject
General Physics and Astronomy,General Engineering,General Materials Science
Link
http://pubs.acs.org/doi/pdf/10.1021/acsnano.0c07163
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