Molecular Approach for Engineering Interfacial Interactions in Magnetic/Topological Insulator Heterostructures

Author:

Cuxart Marc G.1ORCID,Valbuena Miguel Angel1ORCID,Robles Roberto2ORCID,Moreno César1ORCID,Bonell Frédéric1,Sauthier Guillaume1,Imaz Inhar1ORCID,Xu Heng1,Nistor Corneliu3,Barla Alessandro4,Gargiani Pierluigi5ORCID,Valvidares Manuel5,Maspoch Daniel16ORCID,Gambardella Pietro3,Valenzuela Sergio O.16,Mugarza Aitor16ORCID

Affiliation:

1. Catalan Institute of Nanoscience and Nanotechnology (ICN2), CSIC and BIST, Campus UAB, 08193 Barcelona, Spain

2. Centro de Fı́sica de Materiales CFM/MPC (CSIC-UPV/EHU), 20018 Donostia-San Sebastián Spain

3. Department of Materials, ETH Zurich, Hönggerbergring 64, CH-8093 Zurich, Switzerland

4. Istituto di Struttura della Materia (ISM), Consiglio Nazionale delle Ricerche (CNR), I-34149 Trieste, Italy

5. ALBA Synchrotron Light Source, Carretera BP 1413km 3.3, E-08290 Cerdanyola del Vallès, Spain

6. Institució Catalana de Recerca i Estudis Avançats (ICREA), 08070 Barcelona, Spain

Funder

Departament d'Innovaci?, Universitats i Empresa, Generalitat de Catalunya

European Regional Development Fund

Ministerio de Econom?a y Competitividad

H2020 Future and Emerging Technologies

Generalitat de Catalunya

FP7 Ideas: European Research Council

Agencia Estatal de Investigaci?n

Publisher

American Chemical Society (ACS)

Subject

General Physics and Astronomy,General Engineering,General Materials Science

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